We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Surface Analysis Equipment.
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Surface Analysis Equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies

Last Updated: Aggregation Period:Jul 16, 2025~Aug 12, 2025
This ranking is based on the number of page views on our site.

Surface Analysis Equipment Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Jul 16, 2025~Aug 12, 2025
This ranking is based on the number of page views on our site.

  1. ザ・ブルーボアハウス Tokyo//Industrial Electrical Equipment
  2. パスカル Osaka//Industrial Machinery
  3. ケニックス Hyogo//Electronic Components and Semiconductors
  4. 4 null/null
  5. 4 エイブイシー Ibaraki//Testing, Analysis and Measurement

Surface Analysis Equipment Product ranking

Last Updated: Aggregation Period:Jul 16, 2025~Aug 12, 2025
This ranking is based on the number of page views on our site.

  1. Bright Signs Corporation Automatic Surface Analysis Device 5001 Handheld ザ・ブルーボアハウス
  2. Surface analysis device using atoms in the probe (an advanced version of CAICISS) パスカル
  3. Graphene crystal thin film and surface analysis equipment ケニックス
  4. Sienta Omicron Surface Analysis Device ESCA
  5. 4 Time-of-Flight Atomic Scattering Surface Analysis Device "TOFLAS-3000" パスカル

Surface Analysis Equipment Product List

1~6 item / All 6 items

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Graphene crystal thin film and surface analysis equipment

It is composed of MBE film formation mechanisms, surface thermal analysis mechanisms, and RHRRD crystal structure analysis systems!

The product is an in-situ system that combines the growth mechanism of graphene crystal thin films using "MBE method" and "surface thermal decomposition method" with RHEED/LEED surface analysis mechanisms. Using a 6H-SiC micro-tilted ([1-100] 4° off) substrate with a (0001) surface (Si face), the formation of graphene was confirmed through diffraction patterns during the growth of graphene. Additionally, the formation of graphene was also confirmed through micro-Raman measurements. 【Components】 ■ MBE deposition mechanism equipped with a "high-temperature K cell for graphene thin film growth" ■ Surface thermal analysis mechanism using a "heating holder for thermal decomposition of SiC substrate" ■ RHRRD crystal structure analysis system ■ LEED surface observation system *For more details, please refer to the PDF materials or feel free to contact us.

  • Analytical Equipment and Devices

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Bright Signs Corporation Automatic Surface Analysis Device 5001 Handheld

High-speed, easy, accurate, non-destructive surface contact angle analysis device. It measures surface energy (wetting properties) as a substitute for the dyne value.

The Surface Analyst 5001 from BrightSign USA is a handheld complete surface analysis device that allows manufacturers to quantify the quality of material surfaces for adhesion, coating, sealing, painting, printing, or cleaning applications by analyzing water contact angles. It is a standalone model (non-network specification) and is used for on-site handheld measurements. It can be used on a variety of materials, including webs (paper, film, carbon fiber composites) and 3D component materials (such as iron, aluminum, non-ferrous metals, and plastics).

  • Analytical Equipment and Devices
  • Other measurement, recording and measuring instruments

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Time-of-Flight Atomic Scattering Surface Analysis Device "TOFLAS-3000"

Crystal orientation and polarity are clear in 15 minutes! Stable surface analysis is possible without the influence of charging!

The "TOFLAS-3000" is an atomic scattering surface analysis device that can simultaneously perform crystal structure and elemental analysis of solid surfaces such as metals, semiconductors, and insulators. This device has developed the coaxial direct collision ion scattering spectroscopy (CAICISS) method and uses an atom beam of electrically neutral He (Ne, Ar) as a probing tool, allowing for stable surface analysis without the influence of charging, even on insulators. In crystal surface structure analysis, a unique pattern specific to the crystal surface can be obtained by conducting a full-angle scan of the incident angle, making it visually easy to determine the surface structure. 【Features】 ■ Visualization of crystal orientation, symmetry, and the front and back of polar crystals * Easy distinction of the front and back of crystals with wurtzite structures (such as GaN and AlN) ■ Simple elemental analysis and crystal structure analysis for each layer near the surface * Analysis of ultra-thin films is also possible ■ When synchronized with pole figure simulation, it can be operated as if "seen in person" ■ No issues with orientation determination of insulating samples or organic molecular films ■ High-sensitivity evaluation of impurities through simultaneous measurement with SIMS (complementary to TOF spectra) * For more details, please refer to the PDF document or feel free to contact us. * We also accept analysis requests.

  • Analytical Equipment and Devices
  • Semiconductor inspection/test equipment

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Surface analysis device using atoms in the probe (an advanced version of CAICISS)

Crystal orientation and pole production are evident in 15 minutes! Stable surface analysis is possible without the influence of charging! Time-of-flight atomic scattering surface analysis device [We accept analysis requests!]

The "TOFLAS-3000" is an atomic scattering surface analysis device that can simultaneously perform crystal structure and elemental analysis of solid surfaces such as metals, semiconductors, and insulators. This device has developed the coaxial direct collision ion scattering spectroscopy (CAICISS) method, using an atomic beam of electrically neutral He (Ne, Ar) as a probing tool, allowing for stable surface analysis without the influence of charging, even on insulators. In crystal surface structure analysis, a unique pattern specific to the crystal surface can be obtained through an omnidirectional scan of the incident angle, making it visually easy to determine the surface structure. 【Features】 - Visualization of crystal orientation, symmetry, and the front and back of polar crystals * Easy distinction of the front and back of crystals with wurtzite structures (such as GaN and AlN) - Simple elemental analysis and crystal structure analysis for each layer near the surface * Analysis of ultra-thin films is also possible - When synchronized with pole figure simulation, it can be operated as if "seen in person" - No issues with orientation determination of insulating samples or organic molecular films - High-sensitivity evaluation of impurities through simultaneous measurement with SIMS (complementary to TOF spectra) * For more details, please refer to the PDF document or feel free to contact us. * We also accept analysis requests.

  • Analytical Equipment and Devices
  • Semiconductor inspection/test equipment

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Surface analysis device "Ultra High Vacuum Surface Structure Analysis Device"

A surface structure analysis device equipped with an EB evaporator suitable for the fabrication of metal thin films!

The "Ultra High Vacuum Surface Structure Analysis Device" is a surface analysis instrument capable of performing LEED diffraction patterns, Auger analysis, and temperature-programmed desorption analysis for semiconductors and model catalysts. The analyzer is equipped with a LEED/AES mass spectrometer and features an EB evaporator suitable for metal thin film fabrication. Please feel free to contact us if you have any inquiries. 【Specifications】 ■ Surface analysis system: LEED/AES ■ Evaporation source: Ultra high vacuum evaporator "AEV series" ■ Gas source: Hydrogen cracking gun "AEV series" ■ Sample heating: Direct electric heating type (TC contact type sample holder) ■ Sample manipulator: 5-axis operation with X, Y, Z, θ, and in-plane rotation axis, etc. *For more details, please contact us.

  • Analytical Equipment and Devices

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