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Surface Analysis Equipment Product List and Ranking from 13 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 03, 2025～Sep 30, 2025
This ranking is based on the number of page views on our site.

Surface Analysis Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 03, 2025～Sep 30, 2025
This ranking is based on the number of page views on our site.

  1. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  2. ザ・ブルーボアハウス Tokyo//Industrial Electrical Equipment
  3. シエンタ オミクロン Tokyo//Testing, Analysis and Measurement
  4. 4 東邦化研 Saitama//Electronic Components and Semiconductors
  5. 5 北野精機 Tokyo//Manufacturing and processing contract
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Surface Analysis Equipment Product ranking

Last Updated： Aggregation Period:Sep 03, 2025～Sep 30, 2025
This ranking is based on the number of page views on our site.

  1. Bright Signs Corporation Automatic Surface Analysis Device 5001 Handheld ザ・ブルーボアハウス
  2. Sienta Omicron Surface Analysis Device ESCA シエンタ オミクロン
  3. [Analysis Case] Evaluation of Oxidation State of Cu Surface by XPS 一般財団法人材料科学技術振興財団　MST
  4. 4 Accelerating research and development, [new] surface analysis service launched! 一般財団法人材料科学技術振興財団　MST
  5. 5 [Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films 一般財団法人材料科学技術振興財団　MST

Surface Analysis Equipment Product List

1～15 item / All 47 items

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Kitano Seiki Co., Ltd. Technical Services for Vacuum and Experimental Equipment

Kitano Seiki Co., Ltd. Technical Services for Vacuum and Experimental Equipment

Feel free to contact us about any device, regardless of the manufacturer!

To ensure that our customers can use our products with peace of mind, a reliable support system is essential. At Kitano Seiki, we have established a comprehensive support system to maintain the best condition of the equipment used by our customers. We provide services that meet the usage environment and various needs of our customers at appropriate costs. 【Various Equipment and Units】 ○ Deposition Equipment (MBE, CVD, EB, Sputtering, etc.) ○ Analysis Equipment (STM, FIM, TEM, AES, etc.) ○ Various Manipulators ○ Various Sample Transport Mechanisms For more details, please contact us or download the catalog.

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Graphene crystal thin film and surface analysis equipment

Graphene crystal thin film and surface analysis equipment

It is composed of MBE film formation mechanisms, surface thermal analysis mechanisms, and RHRRD crystal structure analysis systems!

The product is an in-situ system that combines the growth mechanism of graphene crystal thin films using "MBE method" and "surface thermal decomposition method" with RHEED/LEED surface analysis mechanisms. Using a 6H-SiC micro-tilted ([1-100] 4° off) substrate with a (0001) surface (Si face), the formation of graphene was confirmed through diffraction patterns during the growth of graphene. Additionally, the formation of graphene was also confirmed through micro-Raman measurements. 【Components】 ■ MBE deposition mechanism equipped with a "high-temperature K cell for graphene thin film growth" ■ Surface thermal analysis mechanism using a "heating holder for thermal decomposition of SiC substrate" ■ RHRRD crystal structure analysis system ■ LEED surface observation system *For more details, please refer to the PDF materials or feel free to contact us.

  • Analytical Equipment and Devices

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[Data] List of Analysis Machines

[Data] List of Analysis Machines

White interference-equipped laser microscopes and micro-Raman spectroscopic measurement devices, among others! A wide range of analytical instruments listed.

In this document, we present a list of various analytical instruments. Starting with the "High-Resolution Gas Chromatography Mass Spectrometry (HRGC/HRMS)," we also feature a wide range of instruments such as the "Ultra-Thin Film Scratch Tester" and the "Micro Vickers Hardness Tester." Additionally, the analysis items include "materials analysis-related" topics such as molecular weight distribution and separation analysis, as well as "environmental measurement analysis-related" topics like radiation measurement and odor analysis. Please feel free to download and take a look. 【Featured Equipment (Partial)】 ■ Ultra-High-Resolution Field Emission Scanning Electron Microscope - EDS (FE-SEM/EDS) ■ Scanning Electron Microscope - Energy Dispersive X-ray Spectroscopy (SEM-EDS) ■ Energy Dispersive X-ray Fluorescence Spectrometer (EDX) ■ Ultraviolet-Visible-Near Infrared Spectrometer (UV-VIS-NIR) ■ Fourier Transform Infrared Spectrometer (FT-IR) *For more details, please refer to the PDF document or feel free to contact us.

  • Analytical Equipment and Devices
  • Other environmental analysis equipment

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Treatment under non-atmospheric exposure

Treatment under non-atmospheric exposure

It is possible to evaluate the sample in its original state.

■Features ? By handling samples under atmospheric non-exposure, it is possible to minimize alteration and changes even for highly reactive samples. ? Cutting, peeling, and surface preparation under atmospheric non-exposure can reduce secondary contamination and oxidation from the atmosphere. ? Methods that can be evaluated under atmospheric non-exposure: SIMS, TOF-SIMS, AES, XPS, SEM, TEM, STEM, Raman, XRD, FIB, etc.

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[Analysis Case] Evaluation of the state of the organic thin film solar cell electrode interface and the dispersion state of the organic film.

[Analysis Case] Evaluation of the state of the organic thin film solar cell electrode interface and the dispersion state of the organic film.

It is possible to conduct a comprehensive evaluation analysis that minimizes the influence of the atmosphere.

Organic devices are devices that use materials susceptible to the effects of oxygen and water. At MST, we conduct analyses with sample transport, processing methods, and measurement environments that minimize atmospheric influences, allowing for evaluations closer to true conditions. We assessed the interface state between the organic film and the electrode using XPS analysis. We can confirm the composition and bonding state of the titania present on the surface of the organic film. Through TOF-SIMS analysis, we examined the dispersion state of P3HT (p-type organic semiconductor) and PCBM (n-type organic semiconductor) within the organic film of bulk and heterostructure organic thin-film solar cells in the depth direction.

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[Analysis Case] Evaluation of Composition Distribution in the Active Layer of Organic Thin-Film Solar Cells

[Analysis Case] Evaluation of Composition Distribution in the Active Layer of Organic Thin-Film Solar Cells

Preprocessing and depth direction analysis are possible under controlled atmosphere conditions.

In bulk heterojunction solar cells using p-type and n-type material active layers, it is necessary to properly control the mixing state of the materials within the film. After performing annealing treatment post-deposition, we conducted TOF-SIMS depth profiling analysis on samples that showed an improvement in photoelectric conversion efficiency along with an increase in fill factor without any change in open-circuit voltage. As a result, it was found that PCBM was segregated at the interface with the PEDOT:PSS layer before annealing.

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[Analysis Case] Evaluation of the State of the Electrode/Organic Layer Interface in Organic EL Devices

[Analysis Case] Evaluation of the State of the Electrode/Organic Layer Interface in Organic EL Devices

The process will be carried out from pretreatment to XPS measurement under an inert gas atmosphere.

We physically peeled off the buffer layer/Alq3 interface and conducted XPS analysis on the peeled surface (buffer layer side). By peeling in an inert gas atmosphere, we were able to expose the interface without destroying the chemical structure, and by transporting it to the XPS device while maintaining the inert gas atmosphere, we minimized post-peeling alterations (such as oxidation and moisture absorption). The main component of the buffer layer is LiF, and it was suggested that some of it may have oxidized. By controlling the atmosphere, it is possible to evaluate the oxidation states of metal elements such as Al and Li due to differences in film formation methods, treatment methods, and organic layers.

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[Analysis Case] Evaluation of the Chemical State of IGZO Film

[Analysis Case] Evaluation of the Chemical State of IGZO Film

Evaluation of bonding state and electronic state using XPS and UPS.

IGZO films are materials that are being researched and developed as TFT materials for displays. Since they are composed of multiple metal elements, it is important to understand how the composition, bonding state, and electronic state change depending on the process. We will introduce examples of evaluating the composition, bonding state, and electronic state of IGZO film surfaces using XPS and UPS.

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[Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films

[Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films

Evaluation of the sp2/(sp2+sp3) ratio using C1s waveform analysis.

Due to its characteristics such as high hardness and high wear resistance, DLC (diamond-like carbon) films are utilized in a wide range of fields. These films are materials that lie between graphite and diamond, and the separation of sp2 (graphite structure) and sp3 (diamond structure) within the film to obtain the sp2/(sp2+sp3) ratio is one of the important factors that determine the properties of the film. Here, we will introduce an example of evaluating this sp2/(sp2+sp3) ratio by analyzing the C1s spectrum using XPS.

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[Analysis Case] Evaluation of Work Function After Thin Film Surface Treatment

[Analysis Case] Evaluation of Work Function After Thin Film Surface Treatment

UPS analysis after surface plasma treatment of ITO.

In semiconductor devices, their performance is greatly influenced by the combination of work functions of various materials that make up the device. Therefore, attempts have been made to control the work function through surface treatments and modifications, and it is important to verify their effects. This document presents an example of evaluating the change in work function of ITO (Sn-doped In2O3), used as an electrode material in organic ELs and solar cells, before and after surface plasma treatment using UPS analysis.

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[Analysis Case] Removal of Organic Contaminants by Etching

[Analysis Case] Removal of Organic Contaminants by Etching

We will remove surface contamination and conduct an evaluation using XPS.

XPS is a surface-sensitive technique, so carbon derived from organic contaminants due to the atmosphere is detected at a significant level. Reducing the influence of this carbon from organic contaminants is important for evaluating the original composition of the film. Typically, Ar ion sputtering is used to remove organic contaminants, but damage caused by sputtering may prevent the evaluation of the film's original composition and bonding states. We present an example where the influence of carbon from organic contaminants was reduced by removing the surface oxide layer using wet etching instead of Ar ion sputtering.

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Comparison of depth profiling analysis using XPS and AES.

Comparison of depth profiling analysis using XPS and AES.

XPS: X-ray Photoelectron Spectroscopy AES: Auger Electron Spectroscopy

XPS and AES are surface-sensitive analytical techniques widely used for evaluating sample surfaces, but by combining them with ion etching, depth profiling analysis becomes possible. When conducting depth profiling analysis, it is important to appropriately differentiate between XPS and AES according to the area to be measured and the material of the sample in order to perform analysis that aligns with the objectives. The characteristics of depth profiling analysis using XPS and AES will be compared using the analysis of SUS passive films as an example.

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[Analysis Case] Composition Evaluation and Morphological Observation of Fuel Cell Catalyst PtRu

[Analysis Case] Composition Evaluation and Morphological Observation of Fuel Cell Catalyst PtRu

Multifaceted evaluation using XPS, SEM, and TEM.

The electrodes of fuel cells have a structure in which catalyst particles are supported on a carbon carrier. Evaluating the state of the carrier and catalyst particles is essential for understanding degradation mechanisms and considering design guidelines. XPS analysis is effective for assessing the state of catalyst poisoning (oxidation). Additionally, SEM and TEM observations are effective for evaluating catalyst agglomeration and particle growth. By combining multiple analytical methods, we propose a multifaceted evaluation.

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[Analysis Case] Evaluation of Bonding State and Film Thickness of SiC Surface

[Analysis Case] Evaluation of Bonding State and Film Thickness of SiC Surface

In addition to detailed condition assessment, film thickness calculation is possible.

XPS can evaluate the chemical bonding state of the sample surface, and further detailed assessments can be made through waveform analysis. Additionally, by using assumed parameters in the waveform analysis results, it is also possible to calculate the thickness of surface oxide films, etc. In this document, we will introduce a case where the composition and state evaluation of the SiC surface was performed, along with the calculation of the oxide film thickness from the obtained peak intensity.

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[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

Evaluation of contamination and oxidation of Si wafers after removing the oxide film with hydrofluoric acid treatment.

Knowledge about the effects of contamination and oxidation during sample transport is important in surface analysis where the detection depth is on the nanometer order. Therefore, we examined the impact of contamination and oxidation due to differences in storage methods on Si wafers. In storage with wrapping paper and aluminum foil, there is a tendency for the peaks of organic materials caused by secondary contamination to be weaker. When samples are wrapped and stored in the matte side of aluminum foil during storage and transport, it can suppress contamination and oxidation compared to other storage methods.

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